journal article·1987-02

Deposition of silicon oxide, nitride and oxynitride thin films by remote plasma enhanced chemical vapor deposition

Gerald Lucovsky, David V. Tsu

Journal of Non-Crystalline Solids· Volume 90· Issue 1-3
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (17)

Show source-provided references
1. Richard · J Vac Sci Technol A · 1985 · 3 · 86710.1116/1.573334 ↗
2. Lucovsky · J Vac Sci Technol A · 1986 · 4 · 68110.1116/1.573832 ↗
3. G. Lucovsky, DV Tsu, PD Richard and RJ Markunas, MRS Symposium Proceedings, (in press).
4. 1978
5. Adams · Solid State Technol · 1983 · 26 · 135
6. Helix · Thin Solid Films · 1978 · 55 · 14310.1016/0040-6090(78)90082-2 ↗
7. Meiners · J Vac Sci Technol · 1982 · 21 · 65510.1116/1.571807 ↗
8. Longeway · J Phys Chem · 1984 · 88 · 7310.1021/j150645a018 ↗
9. Tsu · Phys Rev B · 1986 · 33 · 706910.1103/PhysRevB.33.7069 ↗
10. Tsu · J Vac Sci Technol A · 1986 · 4 · 48010.1116/1.573875 ↗
11. FO Sequida (private communication).
12. Jolly · Adv Chem Ser · 1969 · 80 · 15610.1021/ba-1969-0080.ch012 ↗
13. Chao · J Vac Sci Technol A · 1986 · 4 · 157410.1116/1.573510 ↗
14. G Lucovsky, MJ Mantini, JK Srivastava and EA Irene, J Vac Sci Technol B (in press).
15. Bell · Discuss Faraday Soc · 1970 · 50 · 5510.1039/df9705000055 ↗
16. Galeener · Phys Rev Lett · 1976 · 37 · 141410.1103/PhysRevLett.37.1474 ↗
17. Lucovsky · Phys Rev B · 1983 · 28 · 322510.1103/PhysRevB.28.3225 ↗