journal article·1991

Defect pool model of defect formation in a-Si:H

K. Winer

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Surface Roughness and Optical Measurements

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References (10)

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1. Street · Phys. Rev. · 1989 · B40 · 623610.1103/PhysRevB.40.6236 ↗
2. Winer · Phys. Rev. · 1990 · B41 · 1215010.1103/PhysRevB.41.12150 ↗
3. NV0 = 2×1020 cm−3eV−1, E0 = 0.045 eV, ED0 = 0.6 eV, [H] = 5×1021 cm−3, EP = 0.9 eV, σ = 0.12 eV, and U = 0.2 eV.
4. Pierz · J. Non-Crystall. Solids · 1989 · 114 · 65110.1016/0022-3093(89)90679-0 ↗
5. Kocka · J. Non-Crystall. Solids · 1987 · 97/98 · 71510.1016/0022-3093(87)90169-4 ↗
6. G. Schumm, C.-D. Abel, and G.H. Bauer, this volume.
7. M. Favre, H. Curtins, and A. Shah, this volume.
8. M.J. Powell, C. van Berkel, and S.C. Deane, this volume.
9. P.V. Santos and W.B. Jackson, this volume.
10. Zafar · Phys. Rev. Lett. · 1991 · 66 · 149310.1103/PhysRevLett.66.1493 ↗