Temperature dependence of H radical etching in the deposition of microcrystalline silicon alloy thin films by HG-sensitized photo-CVD
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · GaN-based semiconductor devices and materials · Ga2O3 and related materials
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References (4)
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1. N. Saxena et. al., MRS Symp. Proc. Spring'89 (in print).
2. D. E. Albright et. al., MRS Symp. Proc. Spring'89 (in print).
3. Perrin · 1987 · 75 · 201
4. Matsuda · J. Non-Cryst. Sol. · 1983 · 59&60 · 76710.1016/0022-3093(83)90284-3 ↗