Influence of corona discharge on holographic recording of diffraction gratings in Cu–chalcogenide film structures

The influence of corona discharge on holographic recording of gratings in Cu–As 2 Se 3 and Cu–As 2 S 3 thin film structures was investigated. Applying of negative corona discharge during optical exposure leads to the increase of holographic sensibility of the investigated registration structures, and increases the diffraction efficiency of recorded gratings. Accordingly, the relief of the diffraction gratings formed by chemical etching of such patterns, recorded under action of negative corona discharge , exhibits much higher values of diffraction efficiency in comparison with the case without corona.