journal article·2006-06

Successive segregation in laser-crystallized poly-SiGe thin films

M. Weizman, N.H. Nickel, I. Sieber, B. Yan

Journal of Non-Crystalline Solids· Volume 352· Issue 9-20
Publisher page

Abstract

Polycrystalline silicon-germanium (poly-SiGe) thin films on glass substrates, crystallized with multiple number of laser pulses, were characterized with energy dispersive X-ray and Raman spectroscopy. Strong lateral segregation was observed for laser-crystallized poly-Si 1-x Ge x with 0.33 < x < 0.7, causing the local Ge content to differ by as much as 40% from the average value. The segregation manifests itself in the appearance of well-resolved peaks in the Raman phonon modes. It is shown that the segregation in the samples evolves successively with increasing number of laser pulses.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Laser Material Processing Techniques · Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies

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