journal article·2004-06

Catalytic decomposition of HCN on heated W surfaces to produce CN radicals

Hironobu Umemoto, Takashi Morimoto, Moroyuki Yamawaki, Yoshie Masuda, Atsushi Masuda, Hideki Matsumura

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Abstract

Abstract The catalytic decomposition processes of HCN on heated W surfaces were examined using laser spectroscopic and mass-spectrometric techniques. H atoms and CN radicals were identified as primary decomposition products on the catalyzer surfaces. The effective enthalpy for the production of CN was determined to be 370 kJ mol −1 . The decomposition efficiency of HCN approaches 30% when the catalyzer temperature is over 2000 K. This efficiency is around half of that for H 2 . If CN radicals produced in this manner can be doped in a-Si:H to terminate the dangling bonds, this could be a new technique to suppress the photodegradation of a-Si:H.
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Research context

OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · Ga2O3 and related materials

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