Influence of plasma power and substrate temperature on structure of nanocrystalline germanium carbon thin films by VHF plasma CVD

Abstract The influence of plasma power and substrate temperature on the structure of nanocrystalline germanium carbon thin films was investigated. Films were deposited by the very high frequency plasma chemical vapor deposition technique using hydrogen diluted monomethylgermane (MMG). Plasma power strongly affected the decomposition of hydrogen and MMG. Crystalline volume fraction and bonding states of the atoms in the films depends on plasma power and substrate temperature. FT-IR measurements also revealed that Ge–H n and CH n bonds are sensitive to these factors.