A study comparing measurements of roughness of silicon and SiO2 surfaces and interfaces using scanning probe microscopy and neutron reflectivity
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (13)
Show source-provided references
1. Heyns · 1990 · 293
2. Miyashita · J. Electrochem. Soc. · 1992 · 139 · 213310.1149/1.2221191 ↗
3. Sofield · 1992
4. Binnig · IBM J. Res. Develop. · 1986 · 30 · 355
5. Komiyama · Jpn. J. Appl. Phys. · 1993 · 32 · 293410.1143/JJAP.32.2934 ↗
6. Abe · Jpn. J. Appl. Phys. · 1992 · 31 · 72110.1143/JJAP.31.721 ↗
7. Verhaverbeke · 1993
8. Nakamura · 1993
9. Homma · J. Vac. Sci. Technol. · 1992 · A10 · 205510.1116/1.578024 ↗
10. Nayar · 1993
11. Graf · J. Vac. Sci. Technol · 1993 · A11 · 4
12. Higashi · Appl. Phys. Lett. · 1991 · 58 · 165610.1063/1.105155 ↗
13. Hessel · Chem. Phys. Lett. · 1991 · 186 · 27510.1016/S0009-2614(91)85140-R ↗