journal article·1993-12

Optimisation of the hydrogen content in a-Si:H deposited at high rate by dc magnetron sputtering

N. Beldi, J. Sib, L. Chahed, T. Smaïl, T. Mohammed-Brahim, Z. Djebbour, J.P. Kleider, C. Longeaud, D. Mencaraglia

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Abstract

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Silicon Nanostructures and Photoluminescence

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References (13)

Show source-provided references
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4. Mohammed-Brahim · 1991
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6. Amer · 1984 · Vol. 21B · 83
7. Djebbour · 1992
8. Kleider · J. Non-Cryst. Solids · 1989 · 114 · 43210.1016/0022-3093(89)90608-X ↗
9. Moore · 1984 · Vol 21 C · 239
10. Bhattacharya · Appl. Phys. Lett. · 1988 · 52 · 158710.1063/1.99089 ↗
11. Smaïl · Phil. Mag. B · 1991 · 64 · 67510.1080/13642819108207629 ↗
12. Stutzmann · Phil. Mag. B · 1989 · 60 · 53110.1080/13642818908205926 ↗
13. Nonomura · 1993