journal article·1997-09

The use of ac power on cylindrical magnetrons

Russell J. Hill, Frank Jansen

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Metal and Thin Film Mechanics · Acoustic Wave Resonator Technologies · Particle accelerators and beam dynamics

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References (22)

Show source-provided references
1. Steidel · J. Vac Sci. Tech. · 1971 · 9 · 34610.1116/1.1316605 ↗
2. Kumagi · IEEE Trans. Parts, Hybrids Packaging · 1972 · 8 · 710.1109/TPHP.1972.1136571 ↗
3. Hanfmann · J. Vac. Sci. Tech. · 1973 · 10 · 11110.1116/1.1317917 ↗
4. H. Kumagi, private communication.
5. Chapin · 1979
6. Cormia · 1977
7. McKelvey · 1982
8. Robinson · 1983
9. McKelvey · 1984
10. McKelvey · 1984
11. McKelvey · 1984
12. Sieck · 1994 · 37 · 233
13. V. Kirchhoff et al., DD-Pat 252 205 A1 (Sept. 1986).
14. Este · J. Vac. Sci. Tech. · 1988 · A6 · 184510.1116/1.575266 ↗
15. W.-D. Munz et al., DE-Pat 38 02 852 C2 (Feb. 1988).
16. Szczyrbowski · 1992
17. Latz · 1992
18. Planar magnetron sputtering
19. Patent applied for.
20. Reactive sputtering of SiO2 layers onto large-scale substrate using an ac twin magnetron cathode
21. J.P. Lehan, C.K. Carniglia, these Proceedings, p. 62.
22. These Proceedings.