journal article·1996-05

Precise measurement of the deep defects and surface states in a-Si:H films by absolute CPM

A. Fejfar, A. Poruba, M. Vaněček, J. Kočka

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Surface Roughness and Optical Measurements

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References (15)

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