Absorption and luminescence in amorphous silica synthesized by low-pressure plasmachemical technology

A comparison study of as-deposited by the hydrogen-free SPCVD process silicon dioxide with and without fluorine as well as the one in the form of fused materials is performed to define whether glass forming processing affects its optical properties. Raman scattering, optical absorption in the vacuum ultraviolet region as well as luminescence at different temperatures and various excitation conditions are measured. A difference in Urbach rule parameters and intrinsic defect concentrations for different samples is revealed. No significant impact on the structure responsible for Raman scattering is observed.