journal article·1989-12

Properties of a-boron films prepared by low pressure chemical vapour deposition

C.W. Ong, K.P. Chik, H.K. Wong

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Boron and Carbon Nanomaterials Research · Diamond and Carbon-based Materials Research · Ion-surface interactions and analysis

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References (8)

Show source-provided references
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2. Bagley · J. of Non-Crystalline Solids · 1980 · 35 & 36 · 44110.1016/0022-3093(80)90634-1 ↗
3. Tsai · Physical Review B · 1979 · 19 · 204110.1103/PhysRevB.19.2041 ↗
4. Ong · Rev. Sci. Instrum. · 1989 · 60 · 117410.1063/1.1140281 ↗
5. Blum · Physica Status Solidi(A) · 1977 · 41 · 48110.1002/pssa.2210410217 ↗
6. Lehmann · Spectrochimica Acta · 1961 · 17 · 39610.1016/0371-1951(61)80092-1 ↗
7. Golikova · Soviet Phys.-Solid State · 1969 · 11 · 1341
8. Gewinner · Physica Status Solidi(B) · 1973 · 59 · 39510.1002/pssb.2220590203 ↗