journal article·1983-12

Preparation and properties of microcrystalline silicon films using photochemical vapor deposition

Tadashi Saitoh, Toshikazu Shimada, Masataka Migitaka, Yasuo Tarui

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Nonlinear Optical Materials Studies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (8)

Show source-provided references
1. Saitoh · 1983 · Vol. 22 · 617
2. Saitoh · Appl. Phys. Lett. · 1983 · 42 · 67810.1063/1.94069 ↗
3. Ito · 1982 · 100
4. Mishima · Jpn. J. Appl. Phys. · 1983 · 22 · L4610.1143/JJAP.22.L46 ↗
5. Usui · J. Non-Crystalline Solids · 1979 · 34 · 110.1016/0022-3093(79)90002-4 ↗
6. Matsuda · Jpn. J. Appl. Phys. · 1980 · 19 · L30510.1143/JJAP.19.L305 ↗
7. Peters · 1982 · 324
8. Photochemistry of small molecules