journal article·1980-01

Plasma spectroscopy control and analysis of a-Si:H deposition

A. Matsuda, K. Nakagawa, K. Tanaka, M. Matsumura, S. Yamasaki, H. Okushi, S. Iizima

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Metal and Thin Film Mechanics · Copper Interconnects and Reliability

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References (6)

Show source-provided references
1. Paul · Solid State Commun. · 1976 · 20 · 96910.1016/0038-1098(76)90485-3 ↗
2. Chittick · J. Electrochem. Soc. · 1969 · 116 · 710.1149/1.2411779 ↗
3. Jackson · Thin Solid Films · 1970 · 5 · 20910.1016/0040-6090(70)90095-7 ↗
4. Knights · 1978 · 101
5. Iizima · 1979
6. Tanaka K., Matsumura M., Okushi H., Matsuda A., Nakagawa K., Yamasaki S. and Iizima S., this Conference.