Synchrotron-Excited Luminescence and Converting of Defects and Quantum Dots in Modified Silica Films
Source abstract
Abstract
Optically active defects in modified silicon oxide films on a silicon substrate have been studied by low-temperature photoluminescence (PL) spectroscopy using excitation by synchrotron radiation in the vacuum ultraviolet region. Films of dry thermal silicon oxide obtained by treatment of stoichiometric SiO 2 in hydrogen plasma, films of wet thermal silicon oxide, and films with low dielectric constant (so called "low-k" dielectrics) have been studied. Investigations of various type SiO 2 films detect the PL centers, which can be conditionally divided into two groups. The first group includes intrinsic point defects, the different variants of oxygen-deficient centers (ODCs). The second group contains centers like the spatially confined excitons in silicon quantum dots (SiQDs). It is shown that SiQDs differ in spectral characteristics, are formed in different ways, due to the transformation and clustering of point defects such as E`-centers, ODC(I) and ODC(II). In this case, the size and spectral properties of quantum dots depend on the mechanism of their formation. Schemes for the conversion of these defects are proposed. It was found that for wet films and nonstoichiometric SiO x films treated in hydrogen plasma, "metastable" centers ODC(I) and ODC(II) arise only under the action of synchrotron radiation in the region of interband or exciton absorption and then they decay because of radiative relaxation. The absence of stable ODC centers in these films is due to their clustering and the formation of SiQDs. In "low-k" mesoporous films, on the contrary, silicon quantum dots SiQDs are not formed, but ODC(I) and ODC(II) centers are clearly manifested. A scheme of electronic transitions upon indirect excitation of silicon quantum dots through exciton states of the SiO 2 matrix is considered. The presented results demonstrate the possibility of controlling the optical properties of silicon thin-film structures by creating in them both oxygen-deficient point defects and quantum dots of various sizes.
Source: expertdata · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (49)
Show source-provided references
1. The missing memristor found10.1038/nature06932 ↗
2. The future of electronics based on memristive systems10.1038/s41928-017-0006-8 ↗
3. Scaling Effect on Silicon Nitride Memristor with Highly Doped Si Substrate
4. Role of highly doped Si substrate in bipolar resistive switching of silicon nitride MIS-capacitors10.1016/j.mee.2017.11.002 ↗
5. Compositional and optical properties of SiOx films and (SiOx /SiOy) junctions deposited by HFCVD10.1186/1556-276X-9-422 ↗
6. Atomic and Electronic Structure of SiOx Films Obtained with Hydrogen Electron Cyclotron Resonance Plasma10.1134/S1063776120110084 ↗
7. Optical Properties of the SiOx (x < 2) Thin Films Obtained by Hydrogen Plasma Processing of Thermal Silicon Dioxide10.1134/S0030400X20100173 ↗
8. Origin and spectral degradation of the photoluminescence from a-SiOx10.1063/1.4829285 ↗
9. Short Range Order and Nature of Defects and Traps in Amorphous Silicon Oxynitride10.1103/PhysRevLett.81.1054 ↗
10. Atomic and Electronic Structure of Traps in Silicon Oxide and Silicon Oxynitride10.1080/10408436.2011.592622 ↗
11. Optically active oxygen-defiency-related centers in amorphous silicon dioxide10.1016/S0022-3093(98)00720-0 ↗
12. Defects in oxide glasses
13. Statics and dynamics of excited states of oxygen-deficient centers in SiO210.1134/S1063783410060107 ↗
14. Luminescent defects in nanostructured silica10.1134/S1063783406070092 ↗
15. Experimental evidence for the Si-Si bond model of the 7.6 eV band in SiO2 glass10.1103/PhysRevB.44.12043 ↗
16. Computed Optical Absorption and Photoluminescence Spectra of Neutral Oxygen Vacancies in a-Quartz10.1103/PhysRevLett.79.753 ↗
17. Ab initio theory of optical transitions of point defects in SiO210.1103/PhysRevB.57.818 ↗
18. Competitive relaxation processes of oxygen deficient centers in silica10.1103/PhysRevB.67.033202 ↗
19. UV and vacuum-UV properties of ge related centers in gamma irradiated silica10.1080/10420150215808 ↗
20. Intrinsic Point Defects in Silica for Fiber Optics Applications10.3390/ma14247682 ↗
21. Intrinsic Photoluminescence in Amorphous SiO2, 1979
22. Evidence of Delocalized Excitons in Amorphous Solids10.1103/PhysRevLett.105.116401 ↗
23. Temperature effects in the photoluminescence of semiconductor quantum dots
24. Creation of Si quantum dots in a silica matrix due to conversion of radiation defects under pulsed ion-beam exposure10.1039/C9CP04715H ↗
25. Energy band gaps and excited states in Si QD/SiOx/RyOz (R = Si, Al, Zr) suboxide superlattices
26. Excited states of modified oxygen-deficient centers and Si quantum dots in Gd-implanted silica glasses: emission dynamics and lifetime distributions10.1039/D1CP03826E ↗
27. The temperature behavior and mechanism of exciton luminescence in quantum dots10.1039/C7CP03357E ↗
28. Quantum Confinement in Amorphous Silicon Quantum Dots Embedded in Silicon Nitride10.1103/PhysRevLett.86.1355 ↗
29. A.F. Zatsepin, E.A. Buntov. Synchrotron-Excited Photoluminescence Spectroscopy of Silicon- and Carbon-Containing Quantum Dots in Low Dimensional SiO2 Matrices, in: H. Li, J. Wu, Zh.M. Wang (eds.), Silicon-based nanomaterials, Springer Series in Materials Science, Cham, 2013, 187, pp. 89-117. https://doi.org/10.1007/978-1-4614-8169-0_5.10.1007/978-1-4614-8169-0_5 ↗
30. Thermal activation energy of crystal and amorphous nano-silicon in SiO2 matrix10.1016/j.ssc.2008.07.011 ↗
31. Zn. Zhang · 2009
32. Martinez-Duart · 2006
33. Photoluminescence of pure silicon quantum dots embedded in an amorphous silica wire array10.1039/C7TC01117B ↗
34. Nanoscopic Materials: Size-Dependent Phenomena
35. Charge transport mechanism in periodic mesoporous organosilica low-k dielectric10.1063/1.5113633 ↗
36. Critical properties and charge transport in ethylene bridged organosilica low-κ dielectrics10.1063/1.5145239 ↗
37. Charge Transport in Nonstoichiometric SiOx Obtained by Treatment of Thermal SiO2 in Hydrogen Plasma of Electronic-Cyclotron Resonance10.1134/S1063739721060081 ↗
38. Optical Properties of the SiOx (x < 2) Thin Films Obtained by Hydrogen Plasma Processing of Thermal Silicon Dioxide10.1134/S0030400X20100173 ↗
39. Progress in development of a new luminescence setup at the FinEstBeAMS beamline of the MAX IV laboratory10.1016/j.radmeas.2018.12.011 ↗
40. Performance and characterization of the FinEstBeAMS beamline at the MAX IV Laboratory10.1107/S1600577521006032 ↗
41. FinEstBeaMS – A wide-range Finnish-Estonian Beamline for Materials Science at the 1.5 GeV storage ring at the MAX IV Laboratory10.1016/j.nima.2017.04.002 ↗
42. Electronic structure of silicon dioxide (a Review)10.1134/S106378341402022X ↗
43. Mechanism of quantum dot luminescence excitation within implanted SiO2:Si:C films
44. Time-resolved photoluminescence of implanted SiO2:Si+ films10.1016/j.jnoncrysol.2009.01.048 ↗
45. Size effect in self-trapped exciton photoluminescence from SiO2-based nanoscale materials10.1103/PhysRevB.64.085421 ↗
46. Time-resolved photoluminescence study of silica nanoparticles as compared to bulk type-III fused silica10.1103/PhysRevB.66.035404 ↗
47. Excitonic and electron-hole mechanisms of the creation of Frenkel defects in alkali halides10.1016/S0168-583X(99)00788-0 ↗
48. Cathodoluminescence of wet, dry, and hydrogen-implanted silica films10.1016/j.jnoncrysol.2005.06.017 ↗
49. Band Gap Energy in Silicon10.33697/ajur.2008.010 ↗