Infrared laser ablation of glassy As2Se3

Abstract In this study, we report the first measurements of wavelength and pulse length dependence of ablation thresholds in glassy As 2 Se 3 . Ablation yields, obtained from time-of-flight spectra were compared to laser intensity curves to obtain laser ablation thresholds. The wavelength dependence of the ablation thresholds were obtained by tuning the Vanderbilt–Keck free electron laser in the range of 3.2–5 μm. Pulse dependence of the ablation thresholds were obtained with a 5 μs macropulse in the wavelength range 3.2–5 μm and with macropulses ranging from 200 to 1000 ns at the wavelength of 3.5 μm. The wavelength dependence of the ablation threshold did not indicate that impurity absorption was a major factor in the ablation process in glassy As 2 Se 3 . The ablation threshold decreased with wavelengths corresponding to higher photon energies. In addition, a sharp increase in ablation threshold was observed with decrease in the macropulse length. Optical images of ablation craters at intensities above the threshold reveal significant melting on the sample surface. We will discuss the wavelength and pulse length dependence of the laser ablation threshold in glassy As 2 Se 3 in terms of a multi-photon process and a cumulative heating process.