Plasma corrosion resistance of aluminosilicate glasses containing Ca, Y and B under fluorocarbon plasma with Ar+
Source abstract
Abstract
Abstract In this study, the corrosion resistance of alumino-silicate glass containing Ca, Y and B is assessed against CF4/O2/Ar plasma, with the results compared to those of poly-crystalline and single-crystalline alumina. All of the alumino-silicate glasses containing Ca, Y and B were more resistant than sintered alumina to a plasma-etching gas. Glass samples with boron oxide were less corroded by plasma than those without B2O3, and their surfaces were contaminated by the CFx generated by the plasma reaction. CaO-Y2O3-Al2O3-SiO2 (CYAS) showed a lower etch rate than sapphire and retained a smooth surface microstructure, unlike sintered alumina. The plasma resistance improved with an increase in the calcium oxide content. The improved plasma resistance of CYAS glass is thought to be due to the high sublimation temperature of the calcium fluoride and the strong atomic binding energy of the calcium ions in the glass.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Glass properties and applications · Advanced ceramic materials synthesis · Silicone and Siloxane Chemistry
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (24)
Show source-provided references
1. Lin · Nanomaterials · 2017 · 7 · 18310.3390/nano7070183 ↗
2. Ito · J. Appl. Phys. · 2008 · 47 · 363010.1143/JJAP.47.3630 ↗
3. Fonash · J. Electrochem. Soc. · 1990 · 137 · 388510.1149/1.2086322 ↗
4. Miwa · 2005 · 479
5. T. E. Wicker, R. A. Maraschin, W. S. Kennedy. United States Patent No. 6 (2000) 129, 808.
6. Shih · 2012 · 4
7. Kim · Thin Solid Films · 2011 · 519 · 669810.1016/j.tsf.2011.04.049 ↗
8. Cao · Appl. Surf. Sci. · 2016 · 366 · 30410.1016/j.apsusc.2016.01.092 ↗
9. Kim · Ceram. Int. · 2015 · 41 · 1275710.1016/j.ceramint.2015.06.109 ↗
10. Ramos · Plasma Sources Sci. Technol. · 2007 · 16 · 71110.1088/0963-0252/16/4/004 ↗
11. Reed · 1995 · 35
12. Iwasawa · J. Am. Ceram. Soc. · 2007 · 90 · 232710.1111/j.1551-2916.2007.01738.x ↗
13. Kim · J. Ceram. Soc. Jpn. · 2009 · 117 · 86310.2109/jcersj2.117.863 ↗
14. Kitamura · Mater. Trans. · 2006 · 47 · 167710.2320/matertrans.47.1677 ↗
15. Choi · J. Korean Ceram. Soc. · 2016 · 53 · 70010.4191/kcers.2016.53.6.700 ↗
16. Lee · J. Non-Cryst. Solids · 2010 · 356 · 155910.1016/j.jnoncrysol.2010.05.057 ↗
17. Lee · J. Non-Cryst. Solids · 2012 · 358 · 89810.1016/j.jnoncrysol.2011.12.082 ↗
18. Choi · Corros. Sci. · 2019 · 146 · 24710.1016/j.corsci.2018.10.015 ↗
19. Nojiri · 2015 · 22
20. Cunge · Plasma Sources Sci. Technol. · 2005 · 14 · 59910.1088/0963-0252/14/3/025 ↗
21. Aigueperse · 2005 · 307
22. Oxtoby · 2008 · 76
23. Kim · J. Am. Ceram. Soc. · 2011 · 94 · 345510.1111/j.1551-2916.2011.04589.x ↗
24. Dry etching properties of boron carbon nitride (BCN) films using carbon fluoride gas10.1016/j.diamond.2008.01.062 ↗