Selective crystallization of amorphous silicon thin film by a CW green laser

Abstract A simple and effective method for selective CW laser crystallization of a-Si (CLC) without pre-patterning of a-Si has been reported. By using a metallic shadow mask instead of a photolithographic process, we can reduce the process steps and time compared with a conventional CLC process. It shows very high performance – mobility of 173 cm2/s, Ioff of ∼10−13 A @ Vd = −5 V, Ion/Ioff of >108 – as a p-channel poly-Si TFT even without any pre-/post-treatment to improve TFT characteristics such as plasma hydrogenation.