Deposition and characterization of Sb and Cu doped nanocrystalline SnO2 thin films fabricated by the photochemical method
Source abstract
Abstract
Abstract Sb-doped and Cu-doped SnO 2 thin films were deposited by the photochemical method. A solution containing SnSO 4 and a doping solution containing SbCl 3 or CuSO 4 were alternately dropped on the glass substrate and irradiated by the UV light. The Auger electron spectroscopy measurement revealed that Sb or Cu was contained in the deposited thin films. The dependence of electrical properties of the films on annealing temperature was studied. The Cu-doped SnO 2 thin film showed enhanced electrical conductivity after 400 °C annealing in a nitrogen atmosphere.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Gas Sensing Nanomaterials and Sensors · ZnO doping and properties · Transition Metal Oxide Nanomaterials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (14)
Show source-provided references
1. Chatelon · Thin Solid Films · 1994 · 247 · 16210.1016/0040-6090(94)90794-3 ↗
2. Cao · Thin Solid Films · 1998 · 317 · 44310.1016/S0040-6090(97)00638-X ↗
3. Ji · J. Cryst. Growth · 2003 · 259 · 28210.1016/j.jcrysgro.2003.07.003 ↗
4. Hu · Mater. Chem. Phys. · 2004 · 86 · 2110.1016/j.matchemphys.2004.01.039 ↗
5. Soitah · Mater. Sci. Semicond. Process. · 2010 · 13 · 12510.1016/j.mssp.2010.03.002 ↗
6. Shanthi · J. Cryst. Growth · 1999 · 197 · 85810.1016/S0022-0248(98)01066-5 ↗
7. Ghimbeu · J. Eur. Ceram. Soc. · 2007 · 27 · 20710.1016/j.jeurceramsoc.2006.05.092 ↗
8. Korotcenkova · Mater. Chem. Phys. · 2009 · 113 · 75610.1016/j.matchemphys.2008.08.031 ↗
9. Yang · Thin Solid Films · 2010 · 518 · 554210.1016/j.tsf.2010.04.063 ↗
10. Ito · Jpn. J. Appl. Phys. · 2006 · 45 · 709410.1143/JJAP.45.7094 ↗
11. Ichimura · Jpn. J. Appl. Phys. · 2009 · 48 · 01550310.1143/JJAP.48.015503 ↗
12. Ichimura · Phys. Status Solidi · 2010 · C7 · 1168
13. Tamaki · Sens. Actuators B · 1992 · 9 · 19710.1016/0925-4005(92)80216-K ↗
14. Muhibbullah · Jpn. J. Appl. Phys. · 2010 · 49 · 08110210.1143/JJAP.49.081102 ↗