journal article·1999-04

Properties of SiO2 films deposited on silicon at low temperatures by plasma enhanced decomposition of hexamethyldisilazane

A Pêcheur, J.L Autran, J.P Lazarri, P Pinard

Journal of Non-Crystalline Solids· Volume 245· Issue 1-3
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Abstract

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Research context

OpenAlex topics: Semiconductor materials and devices · ZnO doping and properties · Thin-Film Transistor Technologies

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