journal article·1991

Pass - a chalcogenide-based lithography scheme for I.C. fabrication

M.N. Kozicki, S.W. Hsia, A.E. Owen, P.J.S. Ewen

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Photonic and Optical Devices · Optical Coatings and Gratings · Advancements in Photolithography Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (6)

Show source-provided references
1. Kozicki · 1989 · 251
2. R.E. Belford, E. Hajto and A.E. Owen. To be published in Thin Solid Films.
3. Tai · J. Vac. Sci. Technol. · 1980 · 17 · 116910.1116/1.570634 ↗
4. Mizushima · 1981 · 277
5. Owen · Phil. Mag. B · 1985 · 52 · 34710.1080/13642818508240606 ↗
6. Bernstein · J. Vac. Sci. Technol. B · 1988 · 6 · 229810.1116/1.584074 ↗