journal article·2006-06

Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures

C. Ricciardi, V. Ballarini, M. Galli, M. Liscidini, L.C. Andreani, M. Losurdo, G. Bruno, S. Lettieri, F. Gesuele, P. Maddalena, F. Giorgis

Journal of Non-Crystalline Solids· Volume 352· Issue 9-20
Publisher page

Abstract

: a-Si(1-x)N(x):H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach-Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Photonic and Optical Devices · Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (11)

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