Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures
Source abstract
Abstract
: a-Si(1-x)N(x):H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach-Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Photonic and Optical Devices · Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence
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References (11)
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