Surface morphology and electronic state characterization of Ni–P amorphous alloy films

Abstract Thin films of Ni–P amorphous alloy were deposited by electroless plating onto a p-type silicon substrate. The films underwent a cyclic oxidation–reduction or a crystallization treatments, respectively. The amorphous structure and its crystallization were studied by X-ray diffraction (XRD), differential scanning calorimetry (DSC), extended X-ray absorption fine structure (EXAFS), scanning electron microscopy (SEM), atomic force microscopy (AFM), scanning tunneling microscopy (STM). The change in the surface composition and surface electronic state were investigated by X-ray photoelectron spectroscopy (XPS).