journal article·1996-05

New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma

M. Heintze, R. Zedlitz

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Plasma Diagnostics and Applications · Thin-Film Transistor Technologies · Metal and Thin Film Mechanics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (8)

Show source-provided references
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2. Kortshagen · Plasma Sources Sci. Technol. · 1995 · 4 · 17210.1088/0963-0252/4/2/002 ↗
3. Heintze · J. Phys. D: Appl. Phys. · 1993 · 26 · 178110.1088/0022-3727/26/10/036 ↗
4. Kroll · 1994 · 336 · 115
5. Beneking · J. Appl. Phys. · 1990 · 68 · 446110.1063/1.346196 ↗
6. van Roosmalen · Appl. Phys. Lett. · 1983 · 42 · 41610.1063/1.93948 ↗
7. Coburn · J. Vac. Sci. Technol. · 1971 · 8 · 73810.1116/1.1315386 ↗
8. Wang · Appl. Phys. Lett. · 1995 · 66 · 232910.1063/1.113972 ↗