journal article·1998-05Open access

Influence of rapid thermal annealing processes on the properties of SiN :H films deposited by the electron cyclotron resonance method

F.L Martı́nez, I Mártil, G González-Dı́az, B Selle, I Sieber

Abstract

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices

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References (15)

Show source-provided references
1. Hasegawa · J. Vac. Sci. Technol. B · 1986 · 4 · 113010.1116/1.583556 ↗
2. Garcı́a · Philos. Mag. B · 1996 · 73 · 48710.1080/13642819608239130 ↗
3. Lu · J. Vac. Sci. Technol. A · 1995 · 13 · 60710.1116/1.579794 ↗
4. Bruyère · Thin Solid Films · 1992 · 221 · 6510.1016/0040-6090(92)90797-F ↗
5. Hernández-Rojas · Appl. Opt. · 1992 · 31 · 160610.1364/AO.31.001606 ↗
6. Tauc · Phys. Stat. Sol. · 1966 · 15 · 62710.1002/pssb.19660150224 ↗
7. Lanford · J. Appl. Phys. · 1978 · 49 · 247310.1063/1.325095 ↗
8. Yin · Phys. Rev. B · 1991 · 43 · 450710.1103/PhysRevB.43.4507 ↗
9. Bastin · Scanning · 1990 · 12 · 22510.1002/sca.4950120408 ↗
10. Sieber · Fresenius J. Anal. Chem. · 1995 · 353 · 63910.1007/BF00321340 ↗
11. Hasegawa · Appl. Phys. Lett. · 1991 · 58 · 74110.1063/1.104533 ↗
12. Robertson · Philos. Mag. B · 1991 · 63 · 4710.1080/01418639108224430 ↗
13. Stutzmann · Philos. Mag. B · 1989 · 60 · 53110.1080/13642818908205926 ↗
14. Zellama · Phys. Rev. B · 1996 · 53 · 380410.1103/PhysRevB.53.3804 ↗
15. Robertson · Appl. Phys. Lett. · 1991 · 59 · 342510.1063/1.105696 ↗