journal article·2012-09

Temporal electric conductivity variations of hydrogenated amorphous silicon due to high energy protons

Shin-ichiro Sato, Hitoshi Sai, Takeshi Ohshima, Mitsuru Imaizumi, Kazunori Shimazaki, Michio Kondo

Journal of Non-Crystalline Solids· Volume 358· Issue 17
Publisher page

Abstract

Abstract Electric conductivity variations of undoped, n-type and p-type hydrogenated amorphous silicon (a-Si:H) thin films irradiated with various energy protons are systematically investigated. Dark conductivity (DC) and photoconductivity (PC) of the undoped samples increase at first due to proton irradiation and then decrease dramatically with increasing proton fluence. The increase in DC and PC becomes greater with increased proton energy. However, this increase is metastable and gradually decreases with time at room temperature. Similar results are observed in the n-type a-Si:H, whereas only a monotonic decrease is observed in DC and PC for the p-type samples. The increase of both DC and PC due to proton irradiation is attributed to metastable donor center generation. On further irradiation both the DC and PC decrease by the accumulation of radiation-induced defects, which act as deep traps and compensate carriers. The decrease in DC and PC becomes less pronounced as the proton energy increase and can be fitted along a universal line when the proton fluence is converted into displacement per atom (dpa).
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (28)

Show source-provided references
1. Banerjee · 2010 · 002651
2. Sellin · Nucl. Instrum. Methods Phys. Res., Sect. A · 2006 · 557 · 47910.1016/j.nima.2005.10.128 ↗
3. Wrysch · J. Non-Cryst. Solids · 2006 · 352 · 179710.1016/j.jnoncrysol.2005.10.035 ↗
4. Markvart · J. Mater. Sci. Mater. Electron. · 1990 · 1 · 110.1007/BF00716008 ↗
5. Alurralde · Sol. Energy Mater. Sol. Cells · 2004 · 82 · 531
6. Yamaguchi · J. Appl. Phys. · 1996 · 80 · 491610.1063/1.363534 ↗
7. Meillaud · J. Non-Cryst. Solids · 2006 · 352 · 185110.1016/j.jnoncrysol.2005.11.091 ↗
8. Chukichev · J. Non-Cryst. Solids · 2004 · 338–340 · 37810.1016/j.jnoncrysol.2004.03.001 ↗
9. Kuendig · 2000 · 986
10. Srour · IEEE Trans. Nucl. Sci. · 2009 · 56 · 330010.1109/TNS.2009.2034329 ↗
11. Shimazaki · 2006 · 1797
12. Kishimoto · J. Non-Cryst. Solids · 1998 · 227–230 · 23810.1016/S0022-3093(98)00332-9 ↗
13. Amekura · J. Non-Cryst. Solids · 2000 · 266–269 · 44410.1016/S0022-3093(99)00773-5 ↗
14. Navkhandewala · Phys. Rev. B: Condens. Matter · 1981 · 24 · 744310.1103/PhysRevB.24.7443 ↗
15. Scholz · J. Non-Cryst. Solids · 1991 · 137&138 · 25910.1016/S0022-3093(05)80105-X ↗
16. Danesh · Vaccum · 2003 · 69 · 7910.1016/S0042-207X(02)00310-X ↗
17. Sato · J. Non-Cryst. Solids · 2010 · 356 · 211410.1016/j.jnoncrysol.2010.07.018 ↗
18. Staebler · Appl. Phys. Lett. · 1977 · 31 · 29210.1063/1.89674 ↗
19. Loferski · Phys. Rev. · 1958 · 111 · 43210.1103/PhysRev.111.432 ↗
20. Sato · Appl. Phys. Express · 2011 · 4 · 1
21. Matsuura · Jpn. J. Appl. Phys. · 2006 · 45 · 264810.1143/JJAP.45.2648 ↗
22. Messenger · IEEE Trans. Nucl. Sci. · 1992 · 39 · 46810.1109/23.277547 ↗
23. Rybicki · J. Appl. Phys. · 1994 · 75 · 318710.1063/1.356144 ↗
24. Khan · J. Appl. Phys. · 2002 · 91 · 239110.1063/1.1433936 ↗
25. Sato · J. Appl Phys. · 2009 · 105 · 1
26. Amekura · IEEE Trans. Nucl. Sci. · 1998 · 45 · 150810.1109/23.685231 ↗
27. Spear · Philos. Mag. B · 1985 · 52 · 24710.1080/13642818508240598 ↗
28. Yelon · J. Non-Cryst. Solids · 2000 · 266–269 · 43710.1016/S0022-3093(99)00772-3 ↗