Improving the UV transmittance of synthetic quartz through defect repair methods
Source abstract
Abstract
Synthetic quartz materials with high ultraviolet transmittance are widely used in lenses and other optical devices. However, the relatively insufficient transmittance limits the application. In this paper, method of Defect Compensation is proposed to reduce the content of ODC, E`center and NBOHC and synthetic quartz glass with UV high transmittance was prepared successfully. The glass has high transmittance with internal transmittance of 99.9%@193nm, low stress birefringence with 0.9nm/cm @632.8nm and good optical homogeneity with 0.78ppm @ 632.8nm.
Source: expertdata · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Glass properties and applications · Mineralogy and Gemology Studies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (42)
Show source-provided references
1. Silicate glass-to-glass hermetic bonding for encapsulation of next-generation optoelectronics: A review [J]
2. Principles of the development of a silica dielectric for microelectronics packaging [J]10.1557/JMR.1996.0030 ↗
3. Low-temperature 3D printing of transparent silica glass microstructures [J]10.1126/sciadv.adi2958 ↗
4. Silica glass: A material for photonics [J]10.1063/1.373805 ↗
5. High-Precision Printing of Complex Glass Imaging Optics with Precondensed Liquid Silica Resin [J]
6. High-performance geometric phase elements in silica glass [J]10.1063/1.4984066 ↗
7. Optical constants of silica glass from extreme ultraviolet to far infrared at near room temperature [J]10.1364/AO.46.008118 ↗
8. Generation of scratches and their effects on laser damage performance of silica glass [J]10.1038/srep34818 ↗
9. Recent advances in radiation-hardened fiber-based technologies for space applications [J]10.1088/2040-8986/aad271 ↗
10. Fused silica as an optical material [J]10.1364/OME.463349 ↗
11. Glass for high performance optics and laser technology [J]10.1016/0022-3093(91)90076-I ↗
12. Fast microstructuring of silica glasses surface by NIR laser radiation [J]
13. Yb 3+-doped large core silica fiber for fiber laser prepared by glass phase-separation technology [J]10.1364/OL.41.001225 ↗
14. Priestley R. Birefringence dispersion in fused silica for DUV lithography; proceedings of the Optical Microlithography XIV, F, 2001 [C]. SPIE.10.1117/12.435666 ↗
15. Rapid lifetime testing of fused silica for DUV laser applications [J]10.1016/j.jnoncrysol.2010.10.036 ↗
16. Optical properties and structure of defects in silica glass [J]10.2109/jcersj.99.923 ↗
17. Skuja L, Hosono H, Hirano M, et al. Advances in silica based glasses for UV and vacuum UV laser optics; proceedings of the Advanced Organic and Inorganic Optical Materials, F, 2003 [C]. SPIE.10.1117/12.515642 ↗
18. Cooperative defect-enriched SiO2 for oxygen activation and organic dehydrogenation [J]
19. Interconversion between non-bridging oxygen hole center and peroxy radical in F2-laser-irradiated SiO2 glass [J]
20. Laser-induced fluorescence of fused silica irradiated by ArF excimer laser [J]10.1063/1.3608163 ↗
21. Langner A, Sch TZ.G. Plasma outside deposition (POD) of fluorine doped silica for high-power laser applications; proceedings of the Fiber Lasers XI: Technology, Systems, and Applications, F, 2014 [C]. SPIE.10.1117/12.2041745 ↗
22. Schreiber A, Kuhn B, Arnold E, et al. Radiation resistance of quartz glass for VUV discharge lamps; proceedings of the Proceedings of the 10th International Symposium on the Science and Technology of Light Sources, LS10, F, 2004 [C]. CRC Press Boca Raton, FL, USA.
23. Physical disorder and optical properties in the vacuum ultraviolet region of amorphous SiO 2 [J]10.1103/PhysRevLett.87.175501 ↗
24. Improvement of vacuum-ultraviolet transparency of silica glass by modification of point defects [J]10.2109/jcersj.115.85 ↗
25. Luminescence of isoelectronically ion-implanted SiO2 layers [J]10.1002/pssa.200622571 ↗
26. Optical defects produced in fused silica during laser-induced breakdown [J]10.1063/1.1573364 ↗
27. In-situ luminescence monitoring of ion-induced damage evolution in SiO2 and Al2O3 [J]
28. Optical and strong blue emission properties of alumina abrasive grains mediated grinding induced SiO2 glass surfaces for navigation grade sensors [J]10.1016/j.optmat.2021.111181 ↗
29. Creation of glass-characteristic point defects in crystalline SiO2 by 2.5 MeV electrons and by fast neutrons [J]
30. Impact of heat treatment on NBOHC luminescence of OH-containing and H2-impregnated fused silica for deep-ultraviolet applications [J]
31. OH-dependence of ultraviolet emission in porous silica [J]10.1016/S0022-3093(03)00176-5 ↗
32. Ikuta Y, Kikugawa S, Hirano M, et al. Damage behavior of SiO2 glass induced by 193-nm radiation under a simulated operating mode of lithography laser; proceedings of the Laser-Induced Damage in Optical Materials: 2000, F, 2001 [C]. SPIE.10.1117/12.425021 ↗
33. Temperature dependence of hydroxyl formation in the reaction of hydrogen with silica glass [J]10.1063/1.338234 ↗
34. Time-resolved photoluminescence study of silica nanoparticles as compared to bulk type-III fused silica [J]10.1103/PhysRevB.66.035404 ↗
35. Biert Mpfel R, REICHEL.S. Precise measurement of internal transmittance of high absorbing filter glass [J].
36. ESR and PL centers induced by gamma rays in silica [J]10.1016/0168-583X(96)00073-0 ↗
37. Reactive intermediates on the surface of solids (Si02 and Ge02): A review of studies and prospects for their development [J]
38. The natures of point defects in amorphous silicon dioxide [M]
39. Isoelectronic series of twofold coordinated Si, Ge, and Sn atoms in glassy SiO2: a luminescence study [J]10.1016/0022-3093(92)90056-P ↗
40. The origin of the intrinsic 1.9 eV luminescence band in glassy SiO2 [J]
41. Effects of heat treatment of silica-based glasses on their static and dynamic wettability [J]
42. Li R.Q, Yao P, Wang W, et al. Relaxation of Thermal Residual Stress in Laser Irradiated Fused Silica by Annealing Process; proceedings of the Materials Science Forum, F, 2016 [C]. Trans Tech Publ.10.4028/www.scientific.net/MSF.874.345 ↗