Optical and structural properties of amorphous silicon-nitrides and silicon-oxycarbides: Application of multilayer structures for the coupling of Bloch Surface Waves
Source abstract
Abstract
Abstract Hydrogenated amorphous silicon nitrides (a-SiN x :H) and oxycarbides (a-SiO x C y :H) have been grown by means of plasma enhanced chemical vapor deposition (PECVD) at a low power density (40–60 mW/cm 2 ) using silane, ammonia, methane and carbon dioxide as silicon, nitrogen, carbon and oxygen precursors, respectively. Their refractive index dispersion curves have been analyzed by means of specular reflectance spectroscopy and their structural properties by FTIR spectroscopy. Taking advantage of their optical properties, the alloys have been fruitfully applied in dielectric stratified structures, optimized for the propagation of surface electromagnetic waves.
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Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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