journal article·1991

Stability and hole-transport in a-Si:H prepared by “Chemical Annealing”

Hajime Shirai, Tomoyuki Ariyoshi, Jun-ichi Hanna, Isamu Shimizu

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Silicon Nanostructures and Photoluminescence

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References (7)

Show source-provided references
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2. Williamson · J.Non-Cryst. Solids · 1989 · 114 · 22610.1016/0022-3093(89)90120-8 ↗
3. Jackson · Phys. Rev. · 1989 · B32 · 3609
4. Stutzmann · Phys. Rev. · 1985 · B32 · 2310.1103/PhysRevB.32.23 ↗
5. Shirai · Appl.Phys.Lett. · 1991 · 5910.1063/1.106355 ↗
6. Shirai · Jpn.J.Appl.Phys. · 1991 · 30 · L67910.1143/JJAP.30.L679 ↗
7. Knights · Appl. Phys. Lett. · 1981 · 38 · 33110.1063/1.92359 ↗