journal article·2021-01

Ultrastable Ni-P amorphous alloy formed via high temperature electrodeposition

Zhaotao Cui, Chaoqun Pei, Shangshu Wu, Shu Fu, Chunyu Guo, Yini Fang, Mengyang Yan, Si Lan, Tao Feng

Publisher page

Abstract

Abstract Physical vapor deposition is an effective approach to obtain ultrastable glasses. There is a general consensus that preparing stable glasses requires high substrate temperatures. Here, this idea was adopted in the electrodeposition method to prepared ultrastable amorphous alloys for the first time. Eliminating the effect of composition deviation, we demonstrate that the thermodynamic stability of the electrodeposited Ni-P amorphous alloy significantly enhanced with the increase of electrolyte temperature. In contrast to the previously reported Ni-P amorphous alloy with same composition, the ultrastable Ni-P amorphous alloys exhibits a large increment of the onset crystallization temperature (Tx) of ~ 50 K, a stronger resistance against crystallization, and a denser structure with less free volume.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Metallic Glasses and Amorphous Alloys · Phase-change materials and chalcogenides · Electrodeposition and Electroless Coatings

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (37)

Show source-provided references
1. Miracle · Nat. Mater. · 2004 · 3 · 69710.1038/nmat1219 ↗
2. Borodin · Philosop. Mag. A · 1999 · 79 · 188710.1080/01418619908210398 ↗
3. Leocmach · Nat. Commun. · 2012 · 3 · 97410.1038/ncomms1974 ↗
4. Cao · Appl. Phys. Lett. · 2014 · 105 · 697
5. Aji · Physics (College Park Md) · 2013
6. Swallen · Science · 2017 · 315 · 35310.1126/science.1135795 ↗
7. Kearns · Advanced Mater. · 2010 · 22 · 3910.1002/adma.200901673 ↗
8. Yu · Adv. Mater. · 2013 · 25 · 590410.1002/adma.201302700 ↗
9. Yu · Phys. Rev. Lett. · 2015 · 115 · 185501.1
10. Singh · Nat. Mater. · 2013 · 12 · 13910.1038/nmat3521 ↗
11. Kearns · J. Chem. Phys. · 2007 · 127 · 110.1063/1.2789438 ↗
12. Wronkowska · J. Mater. Sci. · 1992 · 27 · 184210.1007/BF01107211 ↗
13. Ke · Key Eng. Mater. · 2008 · 364-366 · 23210.4028/www.scientific.net/KEM.364-366.232 ↗
14. Marshal · Surf. Coat. Technol. · 1992 · 53 · 22310.1016/0257-8972(92)90380-S ↗
15. Pillai · J. Coatings Technol. Res. · 2012 · 9 · 78510.1007/s11998-012-9411-0 ↗
16. Habazaki · Corros. Sci. · 1991 · 32 · 122710.1016/0010-938X(91)90134-B ↗
17. Jeong · Scr. Mater. · 2003 · 48 · 106710.1016/S1359-6462(02)00633-4 ↗
18. Tachev · J. Non Cryst. Solids · 2000 · 270 · 010.1016/S0022-3093(00)00060-0 ↗
19. Masui · J. Jpn. Inst. Metals · 1977 · 41 · 113010.2320/jinstmet1952.41.11_1130 ↗
20. Dong · Scripta Metallurg. Mater. · 1994 · 31 · 8110.1016/0956-716X(94)90099-X ↗
21. Zeller · J. Electrochem. Soc. · 1991 · 138 · 101010.1149/1.2085707 ↗
22. Jin · J. Mater. Eng. · 2016
23. Lan · Commun. Phys. · 2019
24. Pei · J. Alloys Compd. · 2019
25. Liu · Mater. Sci. Forum · 2014 · 789 · 8410.4028/www.scientific.net/MSF.789.84 ↗
26. Kissinger · Anal. Chem. · 1957 · 29 · 170210.1021/ac60131a045 ↗
27. J · Phys. Testing Chem. Anal. Parta Phys. Testing · 2000
28. Shi · Mater. Rep. · 2019
29. Che · Ann. Rev. Mater. Res. · 2008 · 38 · 44510.1146/annurev.matsci.38.060407.130226 ↗
30. Liu · Appl. Phys. Lett. · 2007 · 90 · 513
31. Slipenyuk · Scr. Mater. · 2004 · 50 · 3910.1016/j.scriptamat.2003.09.038 ↗
32. Wang · Scr. Mater. · 2011 · 64 · 8110.1016/j.scriptamat.2010.09.015 ↗
33. Cheng · Appl. Phys. Lett. · 2008 · 93 · 611
34. Xu · Scr. Mater. · 2010 · 62 · 67410.1016/j.scriptamat.2010.01.025 ↗
35. Beukel · J. Sietsma · 1990 · 38 · 383
36. Shao · J. Alloys Compd. · 2013 · 548 · 7710.1016/j.jallcom.2012.08.132 ↗
37. Yavari · Acta Mater. · 2005 · 53 · 161110.1016/j.actamat.2004.12.011 ↗