A protective layer on As2S3 film for photo-resist patterning
Source abstract
Abstract
Abstract We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Photonic and Optical Devices · Phase-change materials and chalcogenides · Semiconductor Lasers and Optical Devices
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References (9)
Show source-provided references
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