Boron diffusion from a spin-on source during rapid thermal processing
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OpenAlex topics: Silicon and Solar Cell Technologies · Advancements in Semiconductor Devices and Circuit Design · Semiconductor materials and devices
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References (12)
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1. Osburn · J. Electrochem. Mater. · 1990 · 19 · 6710.1007/BF02655553 ↗
2. Eichhammer · Appl. Phys. A · 1990 · 50 · 40510.1007/BF00323598 ↗
3. Hong · IEEE Trans. Electron. Devices · 1991 · 38 · 47610.1109/16.75156 ↗
4. C. Park, K.M. Klein, Al.F. Tasch, R.B. Simonton, G.E. Lux, IEDM 91 Tech. Dig. (1991) 6710.1109/IEDM.1991.235422 ↗
5. Fair · Proc. IEEE · 1990 · 79 · 168710.1109/5.63298 ↗
6. Slaoui · Mater. Res. Soc. Proc. · 1995 · 387 · 36510.1557/PROC-387-365 ↗
7. Ling · IEEE Electron. Device Lett. EDL-8 · 1987 · 3 · 9610.1109/EDL.1987.26564 ↗
8. Usami · IEEE Trans. Electron. Devices · 1992 · 39 · 10510.1109/16.108218 ↗
9. Zagozdzon-Wosik · IEEE Trans. Electron. Devices · 1994 · 41 · 228110.1109/16.337440 ↗
10. Zagozdzon-Wosik · IEEE Electron. Device Lett. · 1991 · 12 · 26410.1109/55.82055 ↗
11. S.K. Ghandhi, VLSI Fabrication Principles, Wiley, New York, 1994, p. 211
12. Trumbore · Bell Syst. Tech. J. · 1960 · 39 · 20510.1002/j.1538-7305.1960.tb03928.x ↗