journal article·1989-12

Lattice orientation of microcrystallites in μc-Si:H

Yasutake Toyoshima, Kazuo Arai, Akihisa Matsuda

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Silicon Nanostructures and Photoluminescence

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References (8)

Show source-provided references
1. Kumata · Appl. Phys. Lett. · 1986 · 48 · 138010.1063/1.96915 ↗
2. Toyoshima · Appl. Phys. Lett. · 1987 · 51 · 192510.1063/1.98302 ↗
3. Toyoshima · Appl. Phys. Lett. · 1985 · 46 · 58410.1063/1.95914 ↗
4. Toyoshima · 1985
5. Matsuda · J. Non-Cryst. Solids · 1983 · 59/60 · 76710.1016/0022-3093(83)90284-3 ↗
6. Jones · Chem. Rev. · 1973 · 73 · 40710.1021/cr60285a001 ↗
7. C.C. Tsai, Plasma deposition of amorphous and crystalline silicon, in: Amorphous Silicon and Related Materials, Vol A, ed. H. Fritzsche.
8. Chopra · 1969