journal article·1996-05

Nanocrystalline silicon formation in a SiH4 plasma cell

Masanori Otobe, Tomonori Kanai, Toru Ifuku, Hiroshi Yajima, Shunri Oda

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (7)

Show source-provided references
1. Oda · 1995 · 358 · 721
2. Otobe · 1995 · 377 · 51
3. Watanabe · Plasma Sources Sci. Technol. · 1994 · 3 · 28610.1088/0963-0252/3/3/008 ↗
4. Kono · Jpn. J. Appl. Phys. · 1993 · 32 · L54310.1143/JJAP.32.L543 ↗
5. Volmer · Z. Phys. Chem. · 1926 · 119 · 27710.1515/zpch-1926-11927 ↗
6. Nielsen · 1964
7. M. Otobe, unpublished.