journal article·2002-04

Size controlled nc-Si synthesis by SiO/SiO2 superlattices

J. Heitmann, R. Scholz, M. Schmidt, M. Zacharias

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Abstract

Abstract The synthesis of nc-Si by reactive evaporation of SiO and subsequent thermal induced phase separation is reported. The size control of nc-Si is realized by evaporation of SiO/SiO2 superlattices. By this method a separate control of crystal size and density is possible. A strong blueshift of the photoluminescence signal from 850 to 750 nm with decreasing crystal size without significant intensity degradation is observed. Temperature dependent investigations of the photoluminescence are included.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Silicon Nanostructures and Photoluminescence · Thin-Film Transistor Technologies · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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