Application of As40S60−Se layers for high-efficiency grating production

Abstract Here we investigate image formation properties of As 40 S 60− x Se x layers and their application for gratings fabrication. The light sensitivity of layers, the dissolution kinetics of as-evaporated and exposed layers in amine-based etching solutions have been studied. The surface relief formation was investigated by means of numerical simulation and experimental investigations. The aim was to optimize treatment conditions to increase the efficiency of gratings. Transmission gratings with line periodicity 6–12 μm were prepared by exposure to a halogen-lamp through Cr masks and subsequent etching achieved diffraction efficiencies from 20% to 26%. The recording of holographic gratings was carried out by exposure with Ar or He–Ne laser. Diffraction efficiencies of reflection gratings with spatial frequencies 1800–2400 mm −1 in polarized light were 80–90%. Polymer copies were obtained using the master gratings on the base of As–S–Se layers.