journal article·1983-12

Lifetime of dominant radicals for the deposition of a-Si:H from SiH4 and Si2H6 glow discharges

Akihisa Matsuda, Takao Kaga, Hideo Tanaka, Kazunobu Tanaka

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence

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References (5)

Show source-provided references
1. Scott · Appl. Phys. Lett. · 1980 · 37 · 72710.1063/1.92060 ↗
2. Ogawa · Jpn. J. Appl. Phys. · 1981 · 20 · L63910.1143/JJAP.20.L639 ↗
3. Matsuda · Jpn. J. Appl. Phys. · 1983 · 22 · L11510.1143/JJAP.22.L115 ↗
4. Matsuda · Thin Solid Films · 1982 · 92 · 17110.1016/0040-6090(82)90200-0 ↗
5. Smith · J. Chem. Phys. · 1969 · 51 · 52010.1063/1.1672027 ↗