Thermal Plasma Processing of Nanostructured Si-based Ceramic Materials
Source abstract
Abstract
A novel thermal plasma process, based on Thermal Plasma Chemical Vapor Deposition (TPCVD) for producing nanostructured ceramics from liquid precursors is described. The process combines the rapid thermal decomposition of low-cost liquid precursors injected into an Inductively Coupled Plasma (ICP) with a fast gas phase condensation due to the high cooling rate and short residence time existing in such a plasma. Examples of synthesis of Si-based nanostructured ceramic materials (SiC, Si3N4) as powders or coatings are given. Deposition rates of up to 10 μm/min can be achieved by the present technique.
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Catalytic Processes in Materials Science · Advanced ceramic materials synthesis
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