Production of Monodisperse Nanoparticles and Application of Discrete-Monodisperse Model in Plasma Reactors
Source abstract
Abstract
The particle growth in plasma reactor were investigated by using the discrete-monodisperse (D-M) model for various process conditions. The monodisperse large sized particle distribution predicted by the D-M model are in good agreement with the large sized particles by the discrete-sectional model and also in the experiments by Shiratani et al. (1996). Some fractions of the small size particles are in a neutral state or even charged positively, but most of the large sized monodisperse particles are charged negatively. As the mass generation rate of monomers increases, the large sized particles grow more quickly and the production rate of nanoparticles of 100nm by plasma reactor increases. As the initial electron concentration or the monomer diameter increases, it takes longer time for the large sized particles to grow up to 100nm, but the large sized particle concentration of 100nm increases and the resulting production rate of large sized particles of 100nm increases. As the residence time increases, the time for the large sized particles to grow up to 100nm decreases and the large sized particle concentration of 100nm increases and, as a result, the production rate of large sized particles of 100nm increases. We propose that the plasma reactor can be a good candidate to produce monodisperse nanoparticles.
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Research context
OpenAlex topics: Dust and Plasma Wave Phenomena · Electrohydrodynamics and Fluid Dynamics · Plasma Diagnostics and Applications
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References (40)
Show source-provided references
1. Anderson H.M., R. Jairath & J.L. Mock, 1990. J. Appl. Phys. 67(9), 3999.10.1063/1.344983 ↗
2. Anderson H.M., T.T. Kodas & D.M. Smith, 1989. Am. Ceram. Bull. 68(5), 996.
3. Anderson H.M., M.W. Weiser & D.M. Smith, 1988. In the 90th Annual Meeting of the American Ceramic Society, Cincinnati, OH, May 2 (Paper No. 66-B-88).
4. Bouchoule A. & L. Boufendi, 1994. Plasma Sources Sci. Technol. 3, 292.10.1088/0963-0252/3/3/009 ↗
5. Bouchoule A., L. Boufendi, J. Hermann, A. Plain, T. Hbid, G. Kroesen & W.W. Stoffels, 1996. Pure Appl. Chem. 68(5), 1121.10.1351/pac199668051121 ↗
6. Boufendi L. & A. Bouchoule, 1994. Plasma Sources Sci. Technol. 3, 262.10.1088/0963-0252/3/3/004 ↗
7. Courteille C., Ch. Hollenstein, J.-L. Dorier, P. Gay, W. Schwarzenbach, A.A. Howling, E. Bertran, G. Viera, R. Martins & A. Macarico, 1996. J. Appl. Phys. 80(4), 2069.10.1063/1.363118 ↗
8. Friedlander S.K., 2000. In Smoke, Dust and Haze. Wiley-Interscience, New York.
9. Fujimoto T., K. Okuyama, M. Shimada, Y. Fujishige, M. Adachi & I. Matsui, 2000. J. Appl. Phys. 88(5), 3047.10.1063/1.1287783 ↗
10. Gordiets B.F. & C.M. Ferreira, 1998. J. Appl. Phys. 84(3), 1231.10.1063/1.368188 ↗
11. Gordiets B. F. & C.M. Ferreira, 1999. J. Appl. Phys. 86(8), 4118.10.1063/1.371336 ↗
12. Horanyi M. & C.K. Goertz, 1990. Astrophysical J. 361, 155.10.1086/169178 ↗
13. Howling A.A., L. Sansonnens, J.-L. Dorier & Ch. Hollenstein, 1993. J. Phys. D: Appl. Phys. 26, 1003.10.1088/0022-3727/26/6/019 ↗
14. Kim K.-S. & M. Ikegawa, 1996. Plasma Sources Sci. Technol. 5, 311.10.1088/0963-0252/5/2/029 ↗
15. Kim D.-J. & K.-S. Kim, 1997. Jpn. J. Appl. Phys. 36, 4989.10.1143/JJAP.36.4989 ↗
16. Kim D.-J. & K.-S. Kim, 2000a. Aerosol. Sci. Technol. 32, 293.10.1080/027868200303632 ↗
17. Kim K.-S. & D.-J. Kim, 2000b. J. Appl. Phys. 87(6), 2691.10.1063/1.372243 ↗
18. Kim D.-J. & K.-S. Kim, 2002. AIChE J. 48(11), 2499.10.1002/aic.690481109 ↗
19. Kim K.-S., D.-J. Kim, J.H. Yoon, J.Y. Park, Y. Watanabe & M. Shiatani, 2003. J. Colloid Interface Sci. 257, 195.10.1016/S0021-9797(02)00049-8 ↗
20. Kortshagen U. & U. Bhandarkar, 1999. Phys. Rev. E 60(1), 887.10.1103/PhysRevE.60.887 ↗
21. Kung H.H. & E.I. Ko, 1996. Chem. Eng. J. 64, 203.
22. Landgrebe J.D. & S.E. Pratsinis, 1990. J. Colloid Interface Sci. 139(1), 63.10.1016/0021-9797(90)90445-T ↗
23. Lieberman M.A. & A.J. Lichtenberg, 1994. In Principles of Plasma Discharges and Materials Processing. Wiley-Interscience, New York.
24. Maedler L. & S.E. Pratsinis, 2002. J. Amer. Ceram. Soc. 85, 1713.10.1111/j.1151-2916.2002.tb00340.x ↗
25. Matsoukas T. & M. Russell, 1995. J. Appl. Phys. 77(9), 4285.10.1063/1.359451 ↗
26. Matsoukas T., M. Russell & M. Smith, 1996. J. Vac. Sci. Technol. A14(2), 624.10.1116/1.580156 ↗
27. Riggs J.B., 1988. In An Introduction to Numerical Methods for Chemical Engineers. Texas Tech University Press, Texas.
28. Selwyn G.S., 1993. Semicond. Int. 16, 72.
29. Selwyn G.S., 1994. Plasma Sources Sci. Technol. 3, 340.10.1088/0963-0252/3/3/016 ↗
30. Shiratani M., H. Kawasaki, T. Fukuzawa, H. Tsuruoka, T. Yoshioka, Y. Ueda, S. Singh & Y. Watanabe, 1996. J. Appl. Phys. 79(1), 104.10.1063/1.360916 ↗
31. Shiratani M., H. Kawasaki, T. Fukuzawa, H. Tsuruoka, T. Yoshioka & Y. Watanabe, 1994. Appl. Phys. Lett. 65(15), 1900.10.1063/1.112833 ↗
32. Takai O. & J. Tomizawa, 1987. In ISPC 8th International Symposium on Plasma Chemistry, Paper No. P-164. International Society for Plasma Chemistry, Tokyo, Japan, pp. 2093–2098.
33. Tsantilis S., H.K. Kammler & S.E. Pratsinis, 2002. Chem. Eng. Sci. 57, 2139–2156.10.1016/S0009-2509(02)00107-0 ↗
34. Walch B., M. Horanyi & S. Robertson, 1994. IEEE Trans. Plasma Sci. 22(2), 97.10.1109/27.279010 ↗
35. Walch B., M. Horanyi & S. Robertson, 1995. Phys. Rev. Lett. 75(5), 838.10.1103/PhysRevLett.75.838 ↗
36. Watanabe Y., 1997. Plasma Phys. Control. Fusion 39, A59.10.1088/0741-3335/39/5A/007 ↗
37. Watanabe Y., M. Shiratani, T. Fukuzawa, H. Kawasaki, Y. Ueda, S. Singh & H. Ohkura, 1996a. J. Vac. Sci. Technol. A14(3), 995.10.1116/1.580069 ↗
38. Watanabe Y., M. Shiratani, H. Kawasaki, S. Singh, T. Fukuzawa, Y. Ueda & H. Ohkura, 1996b. J. Vac. Sci. Technol. A14, 540.10.1116/1.580141 ↗
39. Wu C.-Y. & P. Biswas, 1998. Aerosol. Sci. Technol. 29, 359.10.1080/02786829808965576 ↗
40. Wu J.J. & R.C. Flagan, 1988. J. Colloid Interface Sci. 123(2), 339.10.1016/0021-9797(88)90255-X ↗