Multipoint contact modeling of nanoparticle manipulation on rough surface

In this paper, the atomic force microscopy (AFM)-based 2-D pushing of nano/microparticles investigated on rough substrate by assuming a multipoint contact model. First, a new contact model was extracted and presented based on the geometrical profiles of Rumpf, Rabinovich and George models and the contact mechanics theories of JKR and Schwartz, to model the adhesion forces and the deformations in the multipoint contact of rough surfaces. The geometry of a rough surface was defined by two main parameters of asperity height (size of roughness) and asperity wavelength (compactness of asperities distribution). Then, the dynamic behaviors of nano/microparticles with radiuses in range of 50–500 nm studied during their pushing on rough substrate with a hexagonal or square arrangement of asperities. Dynamic behavior of particles were simulated and compared by assuming multipoint and single-point contact schemes. The simulation results show that the assumption of multipoint contact has a considerable influence on determining the critical manipulation force. Additionally, the assumption of smooth surfaces or single-point contact leads to large error in the obtained results. According to the results of previous research, it anticipated that a particles with the radius less than about 550 nm start to slide on smooth substrate; but by using multipoint contact model, the predicted behavior changed, and particles with radii of smaller than 400 nm begin to slide on rough substrate for different height of asperities, at first.