Synthesis of Ni80Fe20 and Co nanodot arrays by self-assembling of polystyrene nanospheres: magnetic and microstructural properties

Array of dots have been designed by assembling a monolayer of polystyrene nanospheres (PN) on sputtered thin films having Ni80Fe20 and Co composition with different thickness, ranging in the interval 20 ÷ 80 nm. Subsequently the films are nanopatterned using the nanospheres as a mask during sputter etching with Ar+ ions. A Reactive Ion Etching (RIE) process before sputter etching is used to control the final diameter of the magnetic dots that thus can be tailored as desired (typically ranging in the interval 250 ÷ 400 nm depending on the PN starting diameter). In addition, electron beam lithography has been exploited to obtain arrays of dots in Ni80Fe20 thin films having approximately the same mean size and dot distance as in self-assembled samples. All films have been routinely characterized by SEM and AFM microscopy to evaluate the microstructure. Magnetic domain patterns at magnetic remanence and in the demagnetised state have been imaged by MFM microscopy technique. Room-temperature hysteresis properties have been measured by an alternating gradient force magnetometer. In general, the magnetization process in all patterned films has been observed to have features typical of a vortex whose nucleation field depends on sample thickness and mean dot dimension. A comparison between magnetic arrays of Ni80Fe20 dots prepared by self-assembling of polystyrene nanospheres and electron beam lithography is presented to rule out the role of microstructure (i.e., order, size, and mutual distance of the magnetic dots) on magnetic properties.