Construction and Application of a UHV Compatible Cluster Deposition System
Source abstract
Abstract
The design and operation of a new UHV-compatible atomic cluster deposition system is described. The design is optimised for high cluster fluxes and for the production of cluster-assembled nano-devices. One key feature of the system is a high degree of flexibility, including interchangeable sputtering and inert gas aggregation sources, and two kinds of mass spectrometer, which allow both characterisation of the cluster size distribution and deposition of mass-selected clusters. Another key feature is that clusters are deposited onto electrically contacted lithographically defined devices mounted on an UHV-compatible cryostat cold finger, allowing deposition at room temperature as well as cryogenic and elevated temperatures. In-situ electrical characterisation of cluster-assembled devices can then be performed in the temperature range 1.2--75 K.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: nanoparticles nucleation surface interactions · Advanced Chemical Physics Studies · Catalytic Processes in Materials Science
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References (24)
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