Smoothness improvement of micrometer- and submicrometer-thick nanocrystalline diamond films produced by MWPECVD
Source abstract
Abstract
Thick (around 3 um) and thin (48-310 nm) nanocrystalline diamond (NCD) films have been produced from Ar-rich CH4/Ar/H2 (1/89/10 %) and H2-rich CH4/H2 (1/99 %) microwave plasmas, respectively. The deposition rate and the nucleation enhancement have been monitored in situ and in real time by pyrometric and laser reflectance interferometry for micrometer- and nanometer-thick films. For thick films, an improvement of the NCD films' smoothness has been obtained by a buffer layer between the films and the treated Si substrate. For thin films, a combinatorial approach, i.e., a treatment of the Si substrate in a suspension of mixed diamond powders of 250 nm and 40-60 um, has been utilized. The present experimental results show that the buffer layer procedure allows good preservation of the surface of the treated Si substrate and the combinatorial approach promotes effectively the seeding of the Si surface.
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · High-pressure geophysics and materials · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (40)
Show source-provided references
1. Achatz P, Williams OA, Bruno P, Gruen DM, Garrido JA, Stutzmann M (2006) Effect of nitrogen on the electronic properties of ultranano crystalline diamond thin films grown on quartz and diamond substrate. Phys Rev B 74(155429):1–7
2. Adamschik M, Kusterer J, Schmid P, Schad KB, Grobe D, Floter A, Kohn E (2002) Diamond microwave micro relay. Diam Relat Mater 11:672–67610.1016/S0925-9635(01)00619-7 ↗
3. Alkhvlediani R, Lior I, Michaelson Sh, Hoffman A (2002) Nanometer rough, sub-micrometer-thick and continuous diamond chemical vapor deposition film promoted by a synergetic ultrasonic effect. Diam Relat Mater 11:545–54910.1016/S0925-9635(01)00646-X ↗
4. Amaral M, Abreu CS, Fernandes AJS, Oliveira FJ, Gomes JR, Silva RF (2010) Nanodiamond-based tribosystems. Surf Coat Technol 204:1962–196910.1016/j.surfcoat.2009.11.015 ↗
5. Bruno G, Capezzuto P, Cicala G, Cramarossa F (1986) Mechanism of film deposition in the RF plasma reduction of silicon tetrachloride. Plasma Chem Plasma Process 6:109–12510.1007/BF00571271 ↗
6. Buijnsters JG, Vazquez L, ter Meulen JJ (2009) Substrate pre-treatment by ultrasonication with diamond powder mixtures for nucleation enhancement in diamond film growth. Diam Relat Mater 18:1239–124610.1016/j.diamond.2009.04.007 ↗
7. Buijnsters JG, Vazquez L, van Dreumel GWG, ter Meulen JJ, van Enckevort WJP, Celis JP (2010) Enhancement of the nucleation of smooth and dense nanocrystalline diamond films by using molybdenum seed layers. J Appl Phys 108(103514):1–9
8. Chen QY, Gruen DM, Krauss AR, Corrigan TD, Witek M, Swain GM (2001) The structure and electrochemical behavior of nitrogen-containing nanocrystalline diamond films deposited from CH4/N2/Ar mixtures. J Electrochem Soc 148:E44–E51. doi: 10.1149/1.134455010.1149/1.1344550 ↗
9. Cicala G, Bruno P, Bénédic F, Silva F, Hassouni K, Senesi GS (2005) Nucleation, growth and characterization of nanocrystalline diamond films. Diam Relat Mater 14:421–42510.1016/j.diamond.2004.12.025 ↗
10. Cicala G, Brescia R, Nitti MA, Romeo A, Altamura D, Giannini C, Capitelli M, Spinelli P, Schutzmann S (2010) Study of polycrystalline diamond deposition by continuous and pulsed discharges. Surf Coat Technol 204:1884–188810.1016/j.surfcoat.2009.09.001 ↗
11. Davidson JL, Kang WP, Wisitsora A (2003) Diamond field emission devices. Diam Relat Mater 12:429–43310.1016/S0925-9635(03)00041-4 ↗
12. Ferrari AC, Robertson J (2001) Origin of the 1,150 cm−1 Raman mode in nanocrystalline diamond. Phys Rev B 63(121405):1–4
13. Goodwin DG (1991) Simulations of high-rate diamond synthesis: methyl as growth species. Appl Phys Lett 59:277–279. doi: 10.1063/1.10562010.1063/1.105620 ↗
14. Gruen DM (2001) Ultrananocrystalline diamond in the laboratory and the cosmos. MRS Bull 26:771–77610.1557/mrs2001.204 ↗
15. Harris SJ (1990) Mechanism for diamond growth from methyl radicals. Appl Phys Lett 56:2298–2300. doi: 10.1063/1.10294610.1063/1.102946 ↗
16. Ilic B, Yang Y, Craighead HG (2004) Virus detection using nanoelectromechanical devices. Appl Phys Lett 85:2604–2606. doi: 10.1063/1.179437810.1063/1.1794378 ↗
17. Kim D, Lee H, Lee J (1993) Effect of reaction pressure on the nucleation behaviour of diamond synthesized by hot-filament chemical vapour deposition. J Mater Sci 28:6704–6708. doi: 10.1007/BF0035641810.1007/BF00356418 ↗
18. Kondoh E, Ohta T, Mitomo T, Ohtsuka K (1993) Surface reaction kinetics of gas-phase diamond growth. J Appl Phys 73:3041–3046. doi: 10.1063/1.35301110.1063/1.353011 ↗
19. Krauss AR, Auciello O, Gruen DM, Jayatissa A, Sumant A, Tucek J, Mancini DC, Moldovan N, Erdemir A, Ersoy D, Gardos MN, Busmann HG, Meyer EM, Ding MQ (2001) Ultrananocrystalline diamond thin films for MEMS and moving mechanical assembly devices. Diam Relat Mater 10:1952–196110.1016/S0925-9635(01)00385-5 ↗
20. Kulisch W, Popov C (2006) On the growth mechanisms of nanocrystalline diamond films. Phys Stat Sol (a) 203:203–219. doi: 10.1002/pssa.2005211210.1002/pssa.200521123 ↗
21. Kulisch W, Popov C, Boycheva S, Jelinek M, Gibson PN, Vorlicek V (2006) Influence of the substrate temperature on the properties of nanocrystalline diamond/amorphous carbon composite films. Surf Coat Technol 200:4731–473610.1016/j.surfcoat.2005.04.007 ↗
22. May PW, Harvey JN, Smith JA, Mankelevich YA (2006) Reevaluation of the mechanism for ultrananocrystalline diamond deposition from Ar/CH4/H2 gas mixtures. J Appl Phys 99:104907–104911. doi: 10.1063/1.219534710.1063/1.2195347 ↗
23. McCauley TG, Gruen DM, Krauss AR (1998) Temperature dependence of the growth rate for nanocrystalline diamond films deposited from an Ar/CH4 microwave plasma. Appl Phys Lett 73:1646–1648. doi: 10.1063/1.12223310.1063/1.122233 ↗
24. Naguib NN, Elam JW, Birrell J, Wang J, Grierson DS, Kabius B, Hiller JM, Sumant AV, Carpick RW, Auciello O, Carlisle JA (2006) Enhanced nucleation, smoothness and conformality of ultrananocrystalline diamond (UNCD) ultrathin films via tungsten interlayers. Chem Phys Lett 430:345–35010.1016/j.cplett.2006.08.137 ↗
25. Pfeiffer R, Kuzmany H, Knoll P, Bokova S, Salk N, Günther B (2003) Evidence for trans-polyacetylene in nano-crystalline diamond films. Diam Relat Mater 12:268–27110.1016/S0925-9635(02)00336-9 ↗
26. Rabeau JR, John P, Wilson JIB, Fan Y (2004) The role of C2 in nanocrystalline diamond growth. J Appl Phys 96:6724–6732. doi: 10.1063/1.181063710.1063/1.1810637 ↗
27. Smolin AA, Ralchenko VG, Pimenov SM, Kononenko TV, Loubnin EN (1993) Optical monitoring of nucleation and growth of diamond films. Appl Phys Lett 62:3449–3451. doi: 10.1063/1.10904510.1063/1.109045 ↗
28. Specht CG, Williams OA, Jackman RB, Schoepfer R (2004) Ordered growth of neurons on diamond. Biomaterials 25:4073–407810.1016/j.biomaterials.2003.11.006 ↗
29. Stacey A, Michaelson SH, Orwa J, Rubanov S, Prawer S, Cowie BCC, Hoffman A (2009) Near coalescent submicron polycrystalline diamond films deposited on silicon: hydrogen bonding and thermal enhanced carbide formation. J Appl Phys 106(103503):1–8
30. Sternschulte H, Rabl HE, Steinmüller-Nethl D, Tilg B (2008) Modelling the influence of the nucleation density on ultra nanocrystalline diamond growth morphology: preliminary results. Chem Vap Depos 14:232–23510.1002/cvde.200706665 ↗
31. Stoner BR, Williams BE, Wolter SD, Nishimura K, Glass JT (1992) In situ growth rate measurement and nucleation enhancement for microwave plasma CVD of diamond. J Mater Res 7:257–26010.1557/JMR.1992.0257 ↗
32. Subramanian K, Kang WP, Davidson JL, Hofmeister WH, Choi BK, Howell M (2005) Nanodiamond planar lateral field emission diode. Diam Relat Mater 14:2099–210410.1016/j.diamond.2005.08.068 ↗
33. Teii K, Ikeda T (2007) Effect of enhanced C2 growth chemistry on nanodiamond film deposition. Appl Phys Lett 90(111504):1–3. doi: 10.1063/1.2713334
34. Tsugawa K, Ishihara M, Kim J, Koga Y, Hasegawa M (2010) Nucleation enhancement of nanocrystalline diamond growth at low substrate temperatures by adamantane seeding. J Phys Chem C 114:3822–382410.1021/jp910555x ↗
35. Wang Y, Miyagi M (1997) Simultaneous measurement of optical constants of dispersive material at visible and infrared wavelengths. Appl Opt 36:877–88410.1364/AO.36.000877 ↗
36. Williams OA (2011) Nanocrystalline diamond. Diam Relat Mater 18:621–64010.1016/j.diamond.2011.02.015 ↗
37. Xiao X, Birrell J, Gerbi JE, Auciello O, Carlisle JA (2004) Low temperature growth of ultrananocrystalline diamond. J Appl Phys 96:2232–2239. doi: 10.1063/1.176960910.1063/1.1769609 ↗
38. Xiao X, Sheldon BW, Qi Y, Kothari AK (2008) Intrinsic stress evolution in nanocrystalline diamond thin films with deposition temperature. Appl Phys Lett 92(131908):1–3
39. Yang W, Auciello O, Butler JE, Cai W, Carlisle JA, Gerbi JE, Gruen DM, Knickerbocker T, Lasseter TL, Russell JN, Smith LM, Hamers RJ (2002a) DNA-modified nanocrystalline diamond thin-films as stable, biologically active substrates. Nat Mater 1:253–257. doi: 10.1038/nmat77910.1038/nmat779 ↗
40. Yang WB, Lu FX, Cao ZX (2002b) Growth of nanocrystalline diamond protective coatings on quartz glass. J Appl Phys 91:10068–10073. doi: 10.1063/1.147947610.1063/1.1479476 ↗