Sub-10-nm-resolution electron-beam lithography toward very-high-density multilevel 3D nano-magnetic information devices
Source abstract
Abstract
We report a study on the optimization of ultra-high-resolution electron-beam lithography for nanoscale patterning with two separate lift-off processes using positive and negative resists; the optimized method is suitable for the emerging area of nano-magnetoelectronics. If used together, these high-aspect-ratio processes can achieve information cells with a diameter of 9 nm, a square pitch of 26 nm, and an etch depth of at least 50 nm, as required for recording densities greater than 3 Tbit/in2, provided that 3D integration includes between 2 and 8 independent magnetic bits. Such effective patterning can be used to further develop magnetic bits packed for ultra-high-density disk recording and the emerging field of magnetic tunneling junctions for logic and memory applications.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Magnetic properties of thin films · Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques
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References (28)
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1. Allwood DA, Xiong G, Faulkner CC, Atkinson D, Petit D, Cowburn RP (2005) Magnetic domain-wall logic. Science 309:1688–169210.1126/science.1108813 ↗
2. Amos N, Ikkawi R, Hong J, Lee B, Litvinov D, Khizroev S (2010) Ultrahigh coercivity magnetic force miscroscopy probes to analyze high-moment magnetic structures and devices. IEEE Magn Lett 1:650010410.1109/LMAG.2010.2050679 ↗
3. Amos N, Butler J, Lee B, Shachar MH, Hu B, Tian Y, Hong J, Ikkawi R, Haddon RC, Litvinov D, Khizroev S (2012) Multilevel-3D bit patterned magnetic media with 8 signal levels per nanocolumn. PLoS One 7:e4013410.1371/journal.pone.0040134 ↗
4. Chow SY, Krauss PR, Renstrom P (1996) Imprint lithography with 25-nanometer resolution. Science 272:85–8710.1126/science.272.5258.85 ↗
5. Grigorescu AE, Hagen CW (2009) Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art. Nanotechnology 20:29200110.1088/0957-4484/20/29/292001 ↗
6. Hamann HF, Martin YC, Wickramasinghe HK (2004) Thermally assisted recording beyond traditional limits. Appl Phys Lett 84:810–81210.1063/1.1644924 ↗
7. Hong J, Niyogi S, Bekyarova E, Itkis ME, Ramesh P, Amos N, Litvinov D, Berger C, de Heer WA, Khizroev S, Haddon RC (2011) Effect of nitrophenyl functionalization on the magnetic properties of epitaxial graphene. Small 7:1175–118010.1002/smll.201002244 ↗
8. Ikkawi R, Amos N, Krichevsky A, Chomko R, Litvinov D, Khizroev S (2007) Nanolasers to enable data storage beyond 10 Tbit/in2. Appl Phys Lett 91:15311510.1063/1.2799239 ↗
9. Khizroev S, Jayasekara W, Bain JA, Jones RE, Kryder MH (1998) MFM quantification of magnetic fields generated by ultra small single pole perpendicular heads. IEEE Trans Magn 34:2030–203210.1109/20.706782 ↗
10. Kikitsu A (2009) Prospects for bit patterned media for high-density magnetic recording. J Magn Magn Mater 321:526–53010.1016/j.jmmm.2008.05.039 ↗
11. Kryder MH, Gustafson RW (2005) High-density perpendicular recording—advances, issues, and extensibility. J Magn Magn Mater 287:449–45810.1016/j.jmmm.2004.10.075 ↗
12. Litvinov D, Parekh V, Ch E, Smith D, Rantschler JO, Weller D, Khizroev S (2008) Recording physics, design considerations, and fabrication of nanoscale bit-patterned media. IEEE Trans Nanotechnol 7:463–47610.1109/TNANO.2008.920183 ↗
13. Moritz J, Vinai G, Auffret S, Dieny B (2011) Two-bit-per-dot patterned media combining in-plane and perpendicular-to-plane magnetized thin films. J Appl Phys 109:08390210.1063/1.3572259 ↗
14. Nagahara K, Mukai T, Ishiwata N, Hada H, Tahara S (2003) Magnetic tunnel junction (MTJ) patterning for magnetic random access memory (MRAM) process applications. Jpn J Appl Phys 42:L499–L50110.1143/JJAP.42.L499 ↗
15. Parekh V, Ruiz A, Ch E, Rantschler J, Ruchhoeft P, Khizroev S, Litvinov D (2007) Fabrication of patterned recording medium using ion beam proximity lithography. In: Proceedings of the 7th IEEE-NANO, pp 632–63610.1109/NANO.2007.4601270 ↗
16. Peng Q, Bertram HN (1997) Micromagnetic studies of switching speed in longitudinal and perpendicular polycrystalline thin film recording media at ultra high densities. J Appl Phys 81:4384–438610.1063/1.364832 ↗
17. Richter HJ (2009) Density limits imposed by the microstructure of magnetic recording media. J Magn Magn Mater 321:467–47610.1016/j.jmmm.2008.04.161 ↗
18. Ross CA (2001) Patterned magnetic recording media. Annu Rev Mater Res 31:203–23510.1146/annurev.matsci.31.1.203 ↗
19. Ross CA, Smith HI, Savas T, Schattenburg M, Farhoud M, Hwang M, Walsh M, Abraham MC, Ram RJ (1999) Fabrication of patterned media for high density magnetic storage. J Vac Sci Technol B 17:3168–317610.1116/1.590974 ↗
20. Rottmayer RE, Batra S, Buechel D, Challener W, Hohlfeld J, Kubota Y, Li L, Lu B, Mihalcea C, Mountfield K, Pelhos K, Peng C, Rausch T, Seigler MA, Weller D, Yang XM (2006) Heat-assisted magnetic recording. IEEE Trans Magn 42:2417–242110.1109/TMAG.2006.879572 ↗
21. Safonov VL, Bertram HN (2001) Collective thermal fluctuations in nominally “independent” granular recording media: application to thermal decay. IEEE Trans Magn 37:1550–155310.1109/20.950897 ↗
22. Terris BD, Thomson T, Hu G (2007) Patterned media for future magnetic data storage. Microsyst Technol 13:189–19610.1007/s00542-006-0144-9 ↗
23. White RL (2000) The physical boundaries to high-density magnetic recording. J Magn Magn Mater 209:1–510.1016/S0304-8853(99)00632-0 ↗
24. Wood R (2009) Future hard disk drive systems. J Magn Magn Mater 321:555–56110.1016/j.jmmm.2008.07.027 ↗
25. Yang X, Xiao S, Wu W, Xu Y, Mountfield K, Rottmayer R, Lee K, Kuo D, Weller D (2007) Challenges in 1 Teradot/in.2 Dot patterning using electron beam lithography for bit-patterned media. J Vac Sci Technol B 25:2202–220910.1116/1.2798711 ↗
26. Yang JKW, Cord B, Duan H, Berggren KK, Klingfus J, Nam SW, Kim KB, Rooks MJ (2009) Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography. J Vac Sci Technol B 27:2622–262710.1116/1.3253652 ↗
27. Yang JKW, Chen Y, Huang T, Duan H, Thiyagarajah N, Hui HK, Leong SH, Ng V (2011) Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in2. Nanotechnology 22:38530110.1088/0957-4484/22/38/385301 ↗
28. Zhu JG, Zhu X, Tang Y (2008) Microwave assisted magnetic recording. IEEE Trans Magn 44:125–13110.1109/TMAG.2007.911031 ↗