Three-dimensional aerial images of periodic patterns and the depth of focus for lines-and-spaces patterns (Erratum)
Source abstract
Abstract
The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry.
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Source: openalex_inverted_index · Quality: needs review · Source record ↗
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Research context
OpenAlex topics: Optical measurement and interference techniques · Surface Roughness and Optical Measurements · Optical Coatings and Gratings
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Affiliations
ASML Technology Development Center, San Jose, California, United States
References
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