journal article·2022-07Open access

Achieving Reliable CoSb3 based thermoelectric joints with low contact resistivity using a high-entropy alloy diffusion barrier layer

Z. Sun, X. Chen, Juncheng Zhang, Huiyuan Geng, L.X. Zhang

Journal of Materiomics· Volume 8· Issue 4

Abstract

Skutterudite (SKD) thermoelectric materials have high conversion efficiency, great mechanical properties, and economical practicability in the medium temperature range (500–550 °C). They need to be joined with metal electrodes to form a thermoelectric power generation device during application. However, high contact resistivity, severe element diffusion, and large coefficient of thermal expansion mismatch are main obstacles for their applications. To address these issues, a FeCoNiCrMo high-entropy alloy diffusion barrier layer was designed and prepared using an arc smelting method in this paper. Effect of heating temperatures on the microstructure and properties of the bonded joints were investigated. The maximum shear strength was 21.6 Mpa and the corresponding reaction layer thickness, contact resistivity were 3.77 μm, 1.8 μΩcm2 respectively at 600 °C, 40 MPa, 10 min. Shear strength dropped down to 18.8 MPa and the contact resistivity increased to 4.2 μΩ cm2 after aging for 640 h. Numerical model was established and it predicted that the contact resistivity would keep lower than 6.5 μΩ cm2 (300 h, 100 days) and 11 μΩ cm2 (8760 h, 1 year) and the reaction layer thickness would not exceed 25 μm (2400 h, 100 days) and 45 μm (8760 h, 1 year).
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Thermoelectric Materials and Devices · Thermal properties of materials · Thermal Expansion and Ionic Conductivity

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (47)

Show source-provided references
1. Chen · J Alloys Compd · 2017 · 699 · 44810.1016/j.jallcom.2016.12.386 ↗
2. Zheng · Renew Sustain Energy Rev · 2014 · 32 · 48610.1016/j.rser.2013.12.053 ↗
3. Prado-Gonjal · ACS Appl Energy Mater · 2018 · 1 · 660910.1021/acsaem.8b01548 ↗
4. Li · J Alloys Compd · 2016 · 677 · 6110.1016/j.jallcom.2016.03.239 ↗
5. Tang · J. Materiomics · 2015 · 1 · 7510.1016/j.jmat.2015.03.008 ↗
6. Han · J. Materiomics · 2021
7. Pei · Nature · 2011 · 473 · 6610.1038/nature09996 ↗
8. LeBlanc · Renew Sustain Energy Rev · 2014 · 32 · 31310.1016/j.rser.2013.12.030 ↗
9. Dado · Scripta Mater · 2010 · 62 · 8910.1016/j.scriptamat.2009.09.029 ↗
10. Sadia · J Solid State Chem · 2016 · 241 · 7910.1016/j.jssc.2016.06.006 ↗
11. Zilber · J Alloys Compd · 2019 · 781 · 113210.1016/j.jallcom.2018.12.165 ↗
12. Meroz · Phys Chem Chem Phys · 2018 · 20 · 409210.1039/C7CP06176E ↗
13. Sadia · J Nanomater · 2013 · 70126810.1155/2013/701268 ↗
14. Zhou · J. Materiomics · 2019 · 5 · 70210.1016/j.jmat.2019.04.008 ↗
15. Salvador · Phys Chem Chem Phys · 2014 · 16 · 1251010.1039/C4CP01582G ↗
16. Choi · AIP Adv · 2016 · 6 · 12501510.1063/1.4971819 ↗
17. Chen · J Alloys Compd · 2016 · 699 · 44810.1016/j.jallcom.2016.12.386 ↗
18. Wojciechowski · Microelectron Reliab · 2011 · 51 · 119810.1016/j.microrel.2011.03.033 ↗
19. Fan · Mater Lett · 2004 · 58 · 387610.1016/j.matlet.2004.07.041 ↗
20. Zhao · J Alloys Compd · 2009 · 477 · 42510.1016/j.jallcom.2008.10.037 ↗
21. Zhao · Intermetallics · 2009 · 17 · 13610.1016/j.intermet.2008.10.010 ↗
22. Guo · J Electron Mater · 2012 · 41 · 103610.1007/s11664-012-1958-0 ↗
23. Geng · J Electron Mater · 2013 · 42 · 199910.1007/s11664-013-2501-7 ↗
24. Ochi · J Electron Mater · 2014 · 43 · 234410.1007/s11664-014-3060-2 ↗
25. He · Energy Environ Sci · 2013 · 6 · 135210.1039/c3ee24193a ↗
26. Park · ACS Appl Energy Mater · 2018 · 1 · 160310.1021/acsaem.8b00064 ↗
27. Zhang · J Alloys Compd · 2013 · 576 · 42410.1016/j.jallcom.2013.05.129 ↗
28. Liu · J. Materiomics · 2019 · 5 · 32110.1016/j.jmat.2019.04.004 ↗
29. Zhang · Adv Eng Mater · 2016 · 18 · 19410.1002/adem.201500333 ↗
30. Li · ACS Appl Mater Interfaces · 2020 · 12 · 4485810.1021/acsami.0c14180 ↗
31. Yeh · Adv Eng Mater · 2004 · 6 · 29910.1002/adem.200300567 ↗
32. Haftlang · Mater Des · 2021 · 11016110.1016/j.matdes.2021.110161 ↗
33. Gaertner · Acta Mater · 2019 · 166 · 35710.1016/j.actamat.2018.12.033 ↗
34. Wang · Mater Des · 2021 · 206 · 10979010.1016/j.matdes.2021.109790 ↗
35. Dai · Mater Des · 2019 · 182 · 10803310.1016/j.matdes.2019.108033 ↗
36. Zhang · Prog Mater Sci · 2014 · 61 · 110.1016/j.pmatsci.2013.10.001 ↗
37. Tsai · Thin Solid Films · 2008 · 516 · 552710.1016/j.tsf.2007.07.109 ↗
38. Yeh · 2016 · 1
39. Webb · J Am Chem Soc · 1962 · 84 · 69010.1021/ja00863a051 ↗
40. Snyder · 2011 · 101
41. Takenaka · J Appl Phys · 2012 · 11210.1063/1.4759121 ↗
42. Gu · J Alloys Compd · 2014 · 610 · 66510.1016/j.jallcom.2014.05.087 ↗
43. Nowakowski · Phys Stat Mech Appl · 1998 · 255 · 9310.1016/S0378-4371(98)00048-X ↗
44. Placha · Materials · 2018 · 11
45. Nowakowski · Phys Stat Mech Appl · 1998 · 255 · 9310.1016/S0378-4371(98)00048-X ↗
46. Song · J Alloys Compd · 2019 · 818 · 15291710.1016/j.jallcom.2019.152917 ↗
47. Tang · Inorg Mater · 2015 · 30 · 25610.15541/jim20140378 ↗