journal article·1979-01

3962. Technology of ion beam sources used in sputtering. (USA)

Authors not provided

Vacuum· Volume 29· Issue 4-5
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Electrostatic Discharge in Electronics · Metal and Thin Film Mechanics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.