journal article·1983-06

Chemical sputtering yields of silicon resulting from F+, CFn+ (n=1,2,3) ion bombardment

Authors not provided

Vacuum· Volume 33· Issue 6
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Ion-surface interactions and analysis · Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.