journal article·1991-01

7216. Oxidation kinetics of plasma-enhanced chemical deposition silicon nitride films deposited SiH4/NH3/NF3/N2 mixtures

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Vacuum· Volume 42· Issue 8-9
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Abstract

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Research context

OpenAlex topics: Diamond and Carbon-based Materials Research · Semiconductor materials and devices · Boron and Carbon Nanomaterials Research

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